Common use of Mask Work Rights Clause in Contracts

Mask Work Rights. Under the Mask Work Rights included in the Houston Licensed IPR, to engage in any Seattle Licensed Activities, including (i) to reproduce and have reproduced (subject to Section 3.2 (Have Made Rights)), by optical, electronic, lithographic or any other means, mask works and semiconductor topologies embodied in Seattle Licensed Products and (ii) to import or distribute a product in which any such mask work or semiconductor topology is embodied.

Mask Work Rights. Under the Mask Work Rights included in the Houston Seattle Licensed IPR, to engage in any Seattle Houston Licensed Activities, including (i) to reproduce and have reproduced (subject to Section 3.2 4.2 (Have Made Rights)), by optical, electronic, lithographic or any other means, mask works and semiconductor topologies embodied in Seattle Houston Licensed Products and (ii) to import or distribute a product in which any such mask work or semiconductor topology is embodied.