ASM International and Hitachi Kokusai Sign Licensing Agreement for Atomic Layer Deposition TechnologyLicensing Agreement • November 27th, 2007
Contract Type FiledNovember 27th, 2007BILTHOVEN, The Netherlands, November 27, 2007 - ASM International N.V. (Nasdaq: ASMI and Euronext Amsterdam: ASM) and Hitachi Kokusai Electric Inc. (Tokyo Stock Exchange (1st Section), and Osaka Securities Exchange (1st Section): Hitachi Kokusai Electric Inc.) announced today that they have signed a licensing agreement. According to this agreement ASM grants usage of its Atomic Layer Deposition (ALD) patents in the field of use of batch ALD to Hitachi Kokusai Electric Inc. Detailed terms of the agreement were not disclosed.