DENOTES CONFIDENTIAL MATERIALS OMITTED AND FILED SEPARATELY WITH THE SECURITIES AND EXCHANGE COMMISSION PURSUANT TO A REQUEST FOR CONFIDENTIAL TREATMENT AMENDED AND RESTATED JOINT DEVELOPMENT PROGRAM AGREEMENTJoint Development Program Agreement • January 13th, 2009 • Micron Technology Inc • Semiconductors & related devices • Delaware
Contract Type FiledJanuary 13th, 2009 Company Industry JurisdictionThis AMENDED AND RESTATED JOINT DEVELOPMENT PROGRAM AGREEMENT (this “Agreement”), is made and entered into as of this 26th day of November, 2008 (“Amendment Date”), by and between Nanya Technology Corporation Nanya Technology Corporation [Translation from Chinese], a company incorporated under the laws of the Republic of China (“NTC”), and Micron Technology, Inc., a Delaware corporation (“Micron”). (NTC and Micron are referred to in this Agreement individually as a “Party” and collectively as the “Parties”).
JOINT DEVELOPMENT PROGRAM AGREEMENTJoint Development Program Agreement • July 8th, 2008 • Micron Technology Inc • Semiconductors & related devices • Delaware
Contract Type FiledJuly 8th, 2008 Company Industry JurisdictionProcess Qualification or Design Qualification, as it pertains to any particular SOW, could be defined in the SOW to include any or all of the following (or additional things) and likely will be different between Stack DRAM Designs for Stack DRAM Modules and Stack DRAM Products: