Baseline data for Global Warming Gas Emissions From the Silicon Dioxide Chamber Clean Process Sample Clauses

Baseline data for Global Warming Gas Emissions From the Silicon Dioxide Chamber Clean Process. Comparison of global warming gas emission data is made using 1995 as the baseline year and making adjustments for variations in production volumes. Table 3 (page 20) provides this comparative data. Use of 1995 as the baseline year is in accordance with the conditions of the MOU. Emissions were slightly higher in 1996, when compared to 1995, while production volume was relatively constant. The decrease in emissions in 1997 is due to reductions in the volume of C2F6 used in the cleaning of the deposition xxxxxxxx based on the results of the process optimization work discussed below. Without the introduction of the optimized cleaning process, 1997 emissions would have increased over 1996. While the introduction of the improved process reduced emissions, the volume reductions would not be sufficient to prevent future year to year emissions increases.